MUNICH, GERMANY--(Marketwired - Sep 15, 2016) - Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) will feature its F7000 EB (electron beam) lithography system in stand 25 at the 42nd Micro and Nano Engineering Show, taking place September 19-23 at the Reed Messe Wien in Vienna, Austria.
The F7000 EB lithography system delivers high throughput and creates very accurate and smooth nano-patterns on wafers from 1X-nm resolutions. Its direct-write technology makes it well-suited as a design tool for research and development as well as a solution for LSI production lines, where small-lot-multiple-type devices are produced. Using character projection technology, the system offers high throughput for both prototyping and production.
Advantest's portfolio of nanotechnology solutions also includes several other products. The E3310 and E3640 MVM-SEM systems enable real-time, 3D measuring and imaging of wafers and masks. For tri-gate processes, the E3310 Wafer MVM-SEM offers high efficiency for volume production. The E3640 Mask MVM-SEM system delivers the industry's best pattern-measurement capability and high throughput for applications including standard photomasks, EUV photomasks and NIL templates.
The E5610 Mask DR-SEM is designed for reviewing and classifying ultra-small defects in next-generation photomasks and blanks. The system offers highly stable, fully automatic image capturing with the long-term operational stability and reliability essential for manufacturing analyses of critical masks.
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MVM-SEM is either a registered trademark or a trademark of Advantest Corporation in Japan, the United States and other countries.
About Advantest Corporation
A world-class technology company, Advantest is the leading producer of automatic test equipment (ATE) for the semiconductor industry and a premier manufacturer of measuring instruments used in the design and production of electronic instruments and systems. Its leading-edge systems and products are integrated into the most advanced semiconductor production lines in the world. The company also focuses on R&D for emerging markets that benefit from advancements in nanotech and terahertz technologies, and has introduced multi-vision metrology scanning electron microscopes essential to photomask manufacturing, as well as groundbreaking 3D imaging and analysis tools. Founded in Tokyo in 1954, Advantest established its first subsidiary in 1982, in the USA, and now has subsidiaries worldwide. More information is available at www.advantest.com.