SOURCE: Aprio Technologies

July 10, 2006 08:00 ET

Aprio Previews Hardware-Assisted Mask Layout Repair Solution

Company to Showcase New Applications Running on KLA-Tencor's DesignScan Platform

SANTA CLARA, CA -- (MARKET WIRE) -- July 10, 2006 -- As part of a series of announcements, Aprio Technologies Inc. today disclosed it will provide an initial demonstration of the results of its development collaboration with KLA-Tencor at the Design Automation Conference in July 2006.

As a result of a new embedded application developed by Aprio™ in cooperation with KLA-Tencor, users of KLA-Tencor's DesignScan tool can quickly and accurately apply localized OPC (optical proximity correction) repair to problem areas identified by DesignScan. Rather than following typical methods of repeated full-chip OPC processing that slow throughput and can introduce new errors in the process, Aprio's new product can dramatically reduce computation requirements because it bypasses the portions of the design that have already passed inspection. This approach can result in a faster and more accurate mask layout inspection and repair process, facilitating more rapid transfer of completed designs to manufacturing.

"We are delighted to be working with KLA-Tencor on advanced mask layout processing applications," said Mike Gianfagna, president and chief executive officer of Aprio Technologies. "By leveraging KLA-Tencors's industry-leading hardware and modeling technology, we will be able to develop unique products that have far-reaching benefits for the design and manufacture of advanced semiconductor devices."

An initial product demonstration will be provided at this year's Design Automation Conference, to be held at San Francisco's Moscone Center from July 24 through 27, 2006. Product availability for the integrated application is expected in the fourth quarter of calendar year 2006.

Through a series of announcements today, Aprio is unveiling its roadmap for the delivery of a comprehensive design-for-manufacturability (DFM) solution, spanning both manufacturing and design applications. Aprio's approach takes aim at the inadequate communication that exists today between integrated circuit design and manufacturing teams. By partnering with key suppliers in the design-to-manufacturing chain, Aprio plans to enable improvements in chip predictability, performance and yield with minimal impact to current design and manufacturing workflows.

About Aprio

Founded in 2003 and headquartered in Santa Clara, California, Aprio Technologies Inc. is a leader in design-for-manufacturability (DFM) solutions that ensure successful design and fabrication of nanometer technology semiconductors. At the core of Aprio's offerings is its unique capability to provide correct and accurate information; to designers about manufacturing issues, and to manufacturing engineers about design intent. Aprio's products leverage this capability to help our customers create more reliable and better yielding semiconductors without the need for dramatic changes to their existing design or tapeout flows. For more information, visit Aprio's Web site at or call +1(408) 855-8088.

Contact Information

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    For Aprio:

    Eva Kam
    Aprio Technologies Inc.

    Patrick Corcoran
    Cain Communications
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