SOURCE: Varian Semiconductor

July 20, 2006 11:58 ET

Varian Semiconductor's New VIISta 900XP Implanter Extends Productivity and Yield Leadership in Medium Current and High Energy

GLOUCESTER, MA -- (MARKET WIRE) -- July 20, 2006 --Varian Semiconductor Equipment Associates, Inc. (NASDAQ: VSEA) today introduced its single wafer VIISta™ 900XP ion implanter. The VIISta 900XP is the first ion implanter to achieve 500 wafers per hour -- the highest throughput in the industry. The product is optimized to address applications in the $450M medium current and $100M retrograde well markets.

The VIISta 900XP is based on the architecture of the market share leading VIISta 810 series. It delivers new levels in productivity and capability, and is the only implanter on the market to offer 500 wafers per hour, closed-loop positioning for accurate implant control, and the broadest energy range, 2keV to 900keV. The VIISta 900XP maintains productivity leadership in the medium current applications space, which includes halo and threshold adjust implants. Additionally, the system is capable of addressing a significant portion of the high energy market including retrograde well applications, both n-well and p-well, which represent a majority of the high energy implant steps in a typical CMOS process. Dedicated and poorly utilized high energy implanters were historically required to achieve these sub-MeV implant steps. The VIISta 900XP offers customers a lower capital cost alternative for addressing these applications by reducing or eliminating the need for high energy implanters.

"The VIISta 900XP delivers improved productivity of more than 25 percent due to increases in mechanical limit throughput, beam current and tune time speed," said Gary Dickerson, Chief Executive Officer of Varian Semiconductor. "Customers have shown strong interest -- multiple leading-edge customers have received tool shipments and have placed orders for more. What really appeals to customers is the opportunity to redirect traditional high energy recipes to a productive medium current tool. A number of customers have plans to use the sub-MeV energy extension of the VIISta 900XP, including a large memory manufacturer that recently released the process into production after completing device qualification. These customers expect to reduce their capital costs associated with expensive high energy implanters."

The VIISta 900XP is also compatible with VSEA's previously announced vMask™ product, which reduces customer R&D costs and improves time-to-market for new device designs. The VIISta 900XP implanter is a key part of the VIISta suite of ion implanters -- the only production-proven single wafer platform solution for all implant segments. All of the VIISta products feature the Varian Control System (VCS™), the Varian Positioning System (VPS™) and a common single wafer endstation. This high degree of commonality across the VIISta platform facilitates process matching throughout the tool set and provides flexibility in managing capacity, product mix changes, spare parts and training.

About Varian Semiconductor

Varian Semiconductor Equipment Associates, Inc. is the leading producer of ion implantation equipment used in the manufacture of semiconductors. The Company is headquartered in Gloucester, Massachusetts, and operates worldwide. Varian Semiconductor maintains a web site at www.vsea.com. The information contained in the Company's web site is not incorporated by reference into this release, and the web site address is included in this release as an inactive textual reference only.

Note: This release contains forward-looking statements for purposes of the safe harbor provisions under The Private Securities Litigation Reform Act of 1995. For this purpose, the statements concerning the Company's performance, market share and technology leadership, technological capabilities and benefits are forward-looking statements and any statements using the terms "believes," "anticipates," "expects," "plans," or similar expressions are forward-looking statements. There are a number of important risks and factors that could cause actual events to differ materially from those suggested or indicated by such forward-looking statements. These include, among others, volatility in the semiconductor equipment industry; economic conditions in general and as they affect the Company's customers; significant fluctuations in the Company's quarterly operating results; the impact of rapid technological change; the Company's dependence on the development and introduction of new products; the Company's concentration on ion implantation systems and related products; concentration in the Company's customer base and lengthy sales cycles; the highly competitive market in which the Company competes; risks of international sales; foreign currency risks; and general economic conditions; and other factors identified in the Company's Annual Report on Form 10-K, and the most recent Quarterly Reports on Form 10-Q filed with the Securities and Exchange Commission. The Company cannot guarantee any future results, levels of activity, performance or achievement. The Company undertakes no obligation to update any of the forward-looking statements after the date of this press release.

Contact Information

  • Contacts:
    Bob Halliday
    Executive Vice President
    Chief Financial Officer
    978.282.7597
    or
    Mary Wright
    Director, Investor Relations
    978.282.5859